 |
Tuesday, 20 Sept 2005, 09:00 – 13:00
Burn J. Lin, TSMC
"The Ending of Optical Lithography and the Prospects
of its Successors"
Daniel Henry, ST Microelectronics
"Status and Future of Maskless Lithography"
Roxann Engelstad, University of Wisconsin
"Mechanical Simulation – A Fundamental Tool
for Advanced Lithography"
Walt Trybula, SEMATECH
"Lithography Cost of Ownership – Projecting the Future"
Wolfgang Hönlein, Infineon Technologies
"Nanoelectronics
beyond Silicon"
Rainer Zimmermann, European
Commission
"Nanoelectronics and Nanophotonics in the European Framework
Programs"
|
| Wednesday, 21 Sept 2005, MNE 2005 Conference Dinner
(19:00 – 22:30
pm) Michel
Menu, Palais et Musée du Louvres
"Works of art analyzed towards the nanometric scale"
|
| Further invited presentations of the MNE 2005 oral
and poster sessions see “program” |
