31st International Conference on Micro- and Nano-Engineering
Vienna, Austria, 19 – 22 September 2005

Prior to MNE 2005, the THIRD EUROPEAN EUVL WORKSHOP will take place in Vienna on Monday, 19 Sept 2005, 9am - 5pm, also at the Hofburg conference center (reception Sunday, 18 Sept 2005, evening, at the Ephesos Museum, Heldenplatz).
On-line registration for the EUVL workshop is possible (see "registration").

After the MNE 2005, a SEMATECH – SELETE – MEDEA+ CPL WORKSHOP, focused on Charged Particle Lithography (ML2 - Mask-Less Lithography, EPL - Electron Projection Lithography, EBDW - Electron Beam Direct Write) will take place in Vienna on Friday, 23 Sept 2005, 9am - 4:30pm, at Hotel Bristol, Kaerntner-Ring 1 (near the Vienna States Opera). Participation is limited to 150 persons.
On-line registration for the CPL workshop is possible (see "registration")