Micro- and Nano-Engineering (MNE) is an international conference on micro- and nanofabrication using lithography and related techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends in the fabrication and applications of micro- and nanostructures. On average the MNE conference has 300–400 participants. The conference proceedings are published in Microelectronic Engineering (Elsevier).
The MNE 2005 conference in Vienna will be the 31st in a series that started in Cambridge in 1975, most recently held in Cambridge (2003) and Rotterdam (2004).
The program will feature plenary and invited presentations, contributed oral and poster presentations, and a commercial exhibition.
On-line registration for the MNE 2005 international conference (see "registration") and for the MNE 2005 commercial exhibition (see "exhibition") is possible.

Prior to MNE 2005, the THIRD EUROPEAN EUVL WORKSHOP will take place in Vienna on Monday, 19 Sept 2005, 9am – 5pm, also at the Hofburg conference centre (reception Sunday, 18 Sept 2005, evening, at the Ephesos Museum, Heldenplatz).
On-line registration for the EUVL workshop is possible (see “registration”).

After the MNE 2005, a SEMATECH – SELETE – MEDEA+ CPL WORKSHOP, focused on Charged Particle Lithography (ML2 - Mask-Less Lithography, EPL – Electron Projection Lithography, EBDW – Electron Beam Direct Write) will take place in Vienna on Friday, 23 Sept 2005, 9am – 4:30pm, at Hotel Bristol, Kaerntner-Ring 1 (near the Vienna States Opera). Participation is limited to 150 persons.
On-line registration for the CPL workshop is possible (see “registration”)